Documentazione : |
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See the ADP/ADS 2 brochure | Scarica |
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See the ADP/ADS 2 flyer | Scarica |
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Richiesta Offerta | Invio |
Related application(s) : |
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Multi-process dry pumps
ADP/ADS Series Two
ADP/ADS Series Two
The ADP/ADS Series Two family covers a large range of vacuum requirements with 4 models. These models can be chosen in LM versions for clean applications, P versions for light/medium applications, and H for harsh applications. Many major manufacturers from the Semiconductor industry have already selected this product. This choice allows them to reduce unscheduled downtime, to reduce overall running cost and increase profitability.
Features:
High reliability to process
• Wide interstage channels are able to accommodate large quantities of powder and particles.
• High operating temperature with a precise closed-loop temperature management system, and a linear increase of gas temperature from inlet to outlet.
• Vertical pumping on each stage which prevents particulate accumulation in the swept volume.
Semiconductor fab rules compliant
• Compact: the series 2 model is only 390 mm wide.
• Clean: Alcatel technology is a frictionless and oil-free pump mechanism. There is no risk of particulate contamination.
• Quiet: All models include an integrated silencer, eliminating the need for an additional external silencer.
• Semi S2 compliant.
Low cost of ownership
• Low power consumption at working pressures and at Ultimate Pressure.
• With moderate heat generation, series 2 water consumption is extremely low.
• Nitrogen Purge level is easily set by the customer. Pumps for clean applications do not require any purge.
Typical applications:
• ADP 122 LM, ADS 602 LM:
Load Lock, Transfer Chambers, PVD, Sputtering
• ADP 122 P, ADS 602 P, ADS 1202 P, ADS 1802 P:
Ashing, Stripping, Dielectric - Poly Etch, Implant Source, Medium CVD
• ADS 602 H, ADS 1202 H, ADS 1802 H:
PECVD, LPCVD
The ADP/ADS Series Two family covers a large range of vacuum requirements with 4 models. These models can be chosen in LM versions for clean applications, P versions for light/medium applications, and H for harsh applications. Many major manufacturers from the Semiconductor industry have already selected this product. This choice allows them to reduce unscheduled downtime, to reduce overall running cost and increase profitability.
Features:
High reliability to process
• Wide interstage channels are able to accommodate large quantities of powder and particles.
• High operating temperature with a precise closed-loop temperature management system, and a linear increase of gas temperature from inlet to outlet.
• Vertical pumping on each stage which prevents particulate accumulation in the swept volume.
Semiconductor fab rules compliant
• Compact: the series 2 model is only 390 mm wide.
• Clean: Alcatel technology is a frictionless and oil-free pump mechanism. There is no risk of particulate contamination.
• Quiet: All models include an integrated silencer, eliminating the need for an additional external silencer.
• Semi S2 compliant.
Low cost of ownership
• Low power consumption at working pressures and at Ultimate Pressure.
• With moderate heat generation, series 2 water consumption is extremely low.
• Nitrogen Purge level is easily set by the customer. Pumps for clean applications do not require any purge.
Typical applications:
• ADP 122 LM, ADS 602 LM:
Load Lock, Transfer Chambers, PVD, Sputtering
• ADP 122 P, ADS 602 P, ADS 1202 P, ADS 1802 P:
Ashing, Stripping, Dielectric - Poly Etch, Implant Source, Medium CVD
• ADS 602 H, ADS 1202 H, ADS 1802 H:
PECVD, LPCVD
