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Alcatel CPM Etch 2610 2001 Best Product Awards

Alcatel Vacuum Technology is proud to announce that The Alcatel CPM Etch 2610 system has been nominated in Semiconductor International's 2001 Editors' Choice Best Product Award Program. As a result, the CPM was selected by the editors as one of only twenty finalists in this year's program. Designed to reduce device defectivity and increase the MTBC for aluminum etch process chambers, the CPM Etch 2610 is the first of a family of Chamber Pressure Management systems for dry etch tools and is configured for the LAM Research TCP 9600 process module. The CPM Etch 2610 has demonstrated significant reductions in defect density, reducing the number of metal parasites on production wafers. It has also demonstrated that the etch process module MTBC can be increased by as much as 25% by the elimination of the throttle valve function for pressure control, thereby making more production time possible on the process tool and increasing OEE. The system consists of an integrated vacuum line from the process chamber isolation valve to atmospheric exhaust with variable speed control on the pumps that allows pressure control during etch processing without the use of the throttlle valve. An optional gas treatment system is available to provide integrated point of use abatement. Three aspects of wafer etch that this product improves are defect reduction due to particulate reduction, improved equipment utilization by increasing MTBC, and Environmental Safety & Health as the gases can now be treated at point of use.